T-01 slurry for the LiTaO3 wafer

Advantage:

1. High removal rate (>15μm/h)

2. Good surface quality: smooth, no obvious scratch, low surface roughness (<0.2nm).
3. An acidic slurry.

Application: Polishing of 4 inch LiTaO? wafer.

LT-02 slurry for the LiTaO? wafer

Advantage:

1. High removal rate (>10μm/h)

2. Good surface quality: smooth, no obvious scratch, low surface roughness (<0.15nm).
3. An alkaline slurry.

Application: Fine polishing of 4 inch LiTaO? wafer.